Browse by category
按分类浏览
Product
产品
Research & development systems, post-oxidation coating systems and DLC coating systems for R&D and production.
研发系统、后氧化镀膜系统与 DLC 镀膜系统，覆盖研发与量产需求。
Components
核心部件
RF & microwave power supplies, magnetron cathodes and gas panel / control units.
射频与微波电源、磁控阴极以及 Gas Panel 与控制单元。
Spare Parts
备件耗材
Semiconductor and vacuum equipment spare parts — cathode components, seals, sensors and consumables.
半导体与真空设备备件——阴极组件、密封件、传感器与耗材。
Service
服务
PCBA reverse development, power supply & vacuum pump repair and equipment agency.
PCBA 逆向开发、电源与真空泵维修与设备代理。
Magnetron Cathodes
磁控阴极
Round, planar and rotary cathodes for uniform deposition in R&D and production.
圆形、平面与旋转阴极，满足研发与量产对均匀沉积的需求。
Learn more →了解更多 →
RF Power Supplies (KVMEN)
射频电源（凯美）
KVMEN solid-state RF generators (13.56 MHz) and automatic matchers from 5 W to 3000 W for plasma and sputtering processes.
凯美全固态射频电源（13.56 MHz）与自动匹配器，5 W – 3000 W，适用于等离子体与溅射工艺。
Learn more →了解更多 →
Gas and Control
气体输送与控制
Gas delivery and control — fully-automatic gas cabinets (GC), gas cylinder racks, valve manifold boxes (VMB) and MFC-based process gas panels for coating systems and semiconductor fabs.
气体输送与控制——全自动气柜（GC）、气瓶架、阀门分配箱（VMB）及基于 MFC 的工艺气体面板，适用于镀膜系统与半导体工厂。
Learn more →了解更多 →
Remote Microwave Plasma Source (SVMW100)
远程微波等离子体源（SVMW100）
SVMW100 solid-state remote microwave plasma source (2.45 GHz, 0-500 W) — remote plasma with neutral radical output, no ion bombardment, zero wafer charging; for ALD oxidation/nitridation and semiconductor dry processing.
SVMW100 固态远程微波等离子体源（2.45 GHz，0-500 W）——远程等离子体，中性自由基输出，无离子轰击、零晶圆充电；适用于 ALD 氧化/氮化与半导体干法处理。
Learn more →了解更多 →
Need a customized configuration?
需要定制配置？
Tell us your materials, substrates and process requirements — our engineers will help define the system boundary.
告诉我们您的材料、基片与工艺需求——我们的工程师将协助定义系统方案。