Round, planar and rotary magnetron cathodes for uniform thin-film deposition in R&D and production.
圆形、平面与旋转磁控阴极,满足研发与量产的均匀薄膜沉积需求。
Magnetron cathodes are the heart of any sputtering system. SEMIVAC supplies round, planar and rotary cathodes engineered for deposition uniformity, target utilization and process stability across research, display, glass, solar and decorative coating applications.
磁控阴极是任何溅射系统的核心。SEMIVAC 提供圆形、平面与旋转阴极,针对研发、显示、玻璃、太阳能与装饰镀膜应用的沉积均匀性、靶材利用率与工艺稳定性而设计。

| Feature | 特性 | Round Type | 圆形阴极 | Planar Type | 平面阴极 | Rotary Type | 旋转阴极 |
|---|---|---|---|---|---|---|---|
| Description | 描述 | Features a circular target for uniform thin-film deposition on relatively small substrates. | 采用圆形靶材,适合较小基片的均匀薄膜沉积。 | Features a rectangular target designed for large-area coating with excellent film uniformity. | 采用矩形靶材,面向大面积镀膜,均匀性优异。 | Uses a rotating cylindrical target to maximize target utilization and provide continuous, uniform deposition. | 采用旋转圆柱靶材,最大化靶材利用率并提供连续均匀的沉积。 |
| Target Shape | 靶材形状 | Circular | 圆形 | Rectangular | 矩形 | Cylindrical (rotary tube) | 圆柱形(旋转管) |
| Main Advantages | 主要优势 | Compact design, uniform deposition, easy target replacement, ideal for R&D | 设计紧凑、沉积均匀、换靶方便,适合研发 | Excellent for large substrates, high uniformity, scalable for production | 适合大尺寸基片、均匀性高、可扩展量产 | Highest utilization (80–90%), longer target life, high deposition rates, lower cost | 利用率最高(80–90%)、靶材寿命长、沉积速率高、运行成本低 |
| Typical Applications | 典型应用 | Semiconductor, R&D, optical coating | 半导体、研发、光学镀膜 | Display panels, architectural glass, solar cells, decorative coating | 显示面板、建筑玻璃、太阳能电池、装饰镀膜 | Large-area glass, display manufacturing, solar panels, roll-to-roll | 大面积玻璃、显示制造、太阳能板、卷对卷 |
| Best Suited For | 适用场景 | Small wafers, laboratory systems, precision coating | 小尺寸晶圆、实验室系统、精密镀膜 | Batch coating, large flat substrates | 批量镀膜、大平面基片 | Continuous, high-throughput industrial coating | 连续高通量工业镀膜 |
Tell us your target size, substrate and process — we will recommend the right cathode configuration.
告诉我们您的靶材尺寸、基片与工艺——我们将推荐合适的阴极配置。