Vacuum coating systems, coating services, core components and repair support for research institutions, universities and industrial manufacturers.
为科研机构、高校与工业企业提供真空镀膜设备、涂层服务、核心部件与维修支持。
Research & development systems, post-oxidation coating systems and DLC coating systems for R&D and production.
研发系统、后氧化镀膜系统与 DLC 镀膜系统,覆盖研发与量产需求。
RF & microwave power supplies, magnetron cathodes and gas panel / control units.
射频与微波电源、磁控阴极以及 Gas Panel 与控制单元。
Semiconductor and vacuum equipment spare parts — cathode components, seals, sensors and consumables.
半导体与真空设备备件——阴极组件、密封件、传感器与耗材。
PCBA reverse development, power supply & vacuum pump repair and equipment agency.
PCBA 逆向开发、电源与真空泵维修与设备代理。

JSD-300 & JSD-450 magnetron sputtering platforms with DC, RF and pulsed-DC sources for metals, dielectrics, co-sputtering and multilayer films.
JSD-300 / JSD-450 磁控溅射平台,支持 DC / RF / 脉冲 DC 电源,适用于金属、介质、共溅射与多层膜制备。
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Wear-resistant diamond-like carbon and TAC films: high hardness, low friction and extended component life.
耐磨类金刚石(DLC)与 TAC 涂层:高硬度、低摩擦、显著延长部件寿命。
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OWLS-1800 metal-mode sputtering system for semiconductor optics, handling wafers up to 12 inches with expandable applications such as simultaneous dual-size and low-temperature coating.
OWLS-1800 金属模式溅射系统,专用于半导体光学,支持最大 12 英寸晶圆,可扩展双尺寸同时镀膜、低温镀膜等应用。
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Round, planar and rotary cathodes for uniform deposition in R&D and production.
圆形、平面与旋转阴极,满足研发与量产对均匀沉积的需求。
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KVMEN solid-state RF generators (13.56 MHz) and automatic matchers from 5 W to 3000 W for plasma and sputtering processes.
凯美全固态射频电源(13.56 MHz)与自动匹配器,5 W – 3000 W,适用于等离子体与溅射工艺。
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Gas delivery and control — fully-automatic gas cabinets (GC), gas cylinder racks, valve manifold boxes (VMB) and MFC-based process gas panels for coating systems and semiconductor fabs.
气体输送与控制——全自动气柜(GC)、气瓶架、阀门分配箱(VMB)及基于 MFC 的工艺气体面板,适用于镀膜系统与半导体工厂。
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One-stop PCBA reverse development: board copying, chip & MCU decryption, design & re-layout, multi-layer rapid manufacturing, SMT assembly and prototype making.
一站式 PCBA 逆向开发:抄板、芯片解密、设计改板、多层快速制造、SMT 加工与样机制作。
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Professional repair and maintenance for vacuum pumps, power supplies and auxiliary equipment to minimize downtime.
真空泵、电源及辅助设备的专业维修保养,最大限度减少停机时间。
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Cathode components, seals, sensors and consumables for semiconductor and vacuum equipment.
阴极组件、密封件、传感器与耗材,适用于半导体与真空设备。
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Component-level repair for semiconductor, plasma and vacuum equipment — PCB boards, power & control units, industrial control components and semiconductor tool power/RF systems.
面向半导体、等离子体与真空设备的板卡元件级维修——PCB 电路板、电源与控制单元、工业控制组件及半导体设备电源/射频系统。
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SVMW100 solid-state remote microwave plasma source (2.45 GHz, 0-500 W) — remote plasma with neutral radical output, no ion bombardment, zero wafer charging; for ALD oxidation/nitridation and semiconductor dry processing.
SVMW100 固态远程微波等离子体源(2.45 GHz,0-500 W)——远程等离子体,中性自由基输出,无离子轰击、零晶圆充电;适用于 ALD 氧化/氮化与半导体干法处理。
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RF ion beam grids and spare parts — replacement grids, support pins, quartz and ceramic insulators, connectors and full parts kits for ion source maintenance.
RF 离子束栅网及备件——替换栅网、支撑销、石英/陶瓷绝缘件、连接器与全套备件包,用于离子源维护。
Learn more →了解更多 →Tell us your materials, substrates and process requirements — our engineers will help define the system boundary.
告诉我们您的材料、基片与工艺需求——我们的工程师将协助定义系统方案。